Wang B, Du J H, Zhang H Y, Cao Y, Wen C Y, Iacovacci V, Lyu Z Y, Li T L, Wang Q Q. 2026. External-field-assisted additive manufacturing for micro/nano device fabrication. Int. J. Extrem. Manuf. 8 012005. DOI: 10.1088/2631-7990/ae098e
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Citation:
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Wang B, Du J H, Zhang H Y, Cao Y, Wen C Y, Iacovacci V, Lyu Z Y, Li T L, Wang Q Q. 2026. External-field-assisted additive manufacturing for micro/nano device fabrication. Int. J. Extrem. Manuf. 8 012005. DOI: 10.1088/2631-7990/ae098e
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Wang B, Du J H, Zhang H Y, Cao Y, Wen C Y, Iacovacci V, Lyu Z Y, Li T L, Wang Q Q. 2026. External-field-assisted additive manufacturing for micro/nano device fabrication. Int. J. Extrem. Manuf. 8 012005. DOI: 10.1088/2631-7990/ae098e
|
Citation:
|
Wang B, Du J H, Zhang H Y, Cao Y, Wen C Y, Iacovacci V, Lyu Z Y, Li T L, Wang Q Q. 2026. External-field-assisted additive manufacturing for micro/nano device fabrication. Int. J. Extrem. Manuf. 8 012005. DOI: 10.1088/2631-7990/ae098e
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